Nanotechnology Essay - 716 Words

Now a days, Nanotechnology is widely used in many industrial areas such as, computing, pharmaceuticals, cosmetics, textile industries and many more. The major challenge is not only to make these materials smaller in size in order to store or process more information but also to optimize the synthesis process. However, the additional key point of the nanotechnology revolution within the next decades is that it will have the capability to use the advantage of mesoscopic properties of such Nano sized materials. These properties can strongly differ from the respective bulk counterparts due to quantum confinement or the high surface-to-volume ratio. For example, there will be increase in bandgap of these Nano materials for which it can be used†¦show more content†¦As the range of the implanted ions become comparable to the size of the small structures, important effects are taken in to account in experimental planning such as , structural changes induced by point defects, strongl y enhanced dynamic annealing and sputtering. Even though a huge number of different nanomaterial systems can be realized with sophisticated synthesis methods, a lot of desired nanostructures will still remain inaccessible due to chemical and physical reasons. The main reason for that is, most of the synthesis method work close or even at thermodynamic equilibrium which is an ideal case. For example, superconductivity at higher temperatures is hard to achieve and yet under research. Issues like solubility limits or surface reconstructions are difficult or even impossible to overcome during synthesis. One alternative option is the subsequent modification of prepared nanomaterials such as Nano wires using energetic ion beam irradiation, which enables processes far from thermodynamic equilibrium. This can result into metastable phases of the nanomaterials/nanostructures with unusual or even exotic structural, electrical, optical or magnetic properties. Furthermore, ion implantation is a very precise and controllable doping method widely used both in research and semiconductor industries. 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